Q:
What is Piranha Solution?
| A) It is a 3:1 to 5:1 mix of nitric acid and hydrogen peroxide that is used to develop the oxide layer on silicon substrate
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B) It is a 3:1 to 5:1 mix of sulphuric acid and hydrofluoric acid that is used to clean silicon wafers removing organic and metal contaminants or photo r
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| C) It is a 3:1 to 5:1 mix of sulphuric acid and hydrogen peroxide that is used to grow the oxide layer on the silicon
| D) It is a 3:1 to 5:1 mix of sulphuric acid and hydrogen peroxide that is used to clean wafers of organic and metal contaminants or photo resist after me
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Explanation
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