The isolated active areas are created by technique known as ___________
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The chemical used for shielding the active areas to achieve selective oxide growth is?
Find the value of [d(t) – d(t-1)] * -x[t+1].
The dopants are introduced in the active areas of silicon by using which process?
If h1, h2 and h3 are cascaded, find the overall impulse response
To grow the polysilicon gate layer, which of the following chemical is used for chemical vapour deposition?
Find the value of [d(t-3) – d(t-1)] * x[t+3].
The process by which Aluminium is grown over the entire wafer, also filling the contact cuts is?
If h1, h2 and h3 are cascaded, and h1 = u(t), h2 = d(t) and h3 = d(t), find the overall impulse response
Chemical Mechanical Polishing is used to ___________
Find the value of [d(t) – u(t-1)] * x[t+1].
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